ISO 25164:2026
International Standard
Current Edition
·
Approved on
03 August 2026
Physical vapor deposition coatings — Magnetron sputtering deposition of TiAlSiN thin films — Specification
ISO 25164:2026 Files
English
6 Pages
Current Edition
OMR
20.53
ISO 25164:2026 Scope
This document specifies the technical requirements for TiAlSiN thin films deposited by magnetron sputtering.
This document is also applicable to the deposition of TiN, TiAlN or TiSiN thin films.
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